Angular distribution of hybridization in sputtered carbon thin film
نویسندگان
چکیده
منابع مشابه
Modification of Thin Film Properties by Sputtered Particles
Irrespective of thin film preparation methods such as PVD and CVD, the thin film process comprises three elementary stages including decomposition, transport, and nucleation and growth mechanisms. Fig. 1 shows the flow chart of the thin film process, where starting materials are successively modified to the resulting films. In the first stage, starting materials in the form of gas, liquid or so...
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The structural and electrochemical properties of RuPt thin-film electrodes fabricated by radio frequency (rf) magnetron sputtering have been investigated. Grazing incidence X-ray diffraction data show a transition from a face-centered cubic (fcc) to hexagonal cubic-packed (hcp) structure as the Ru percentage increases. The transition occurs gradually between 32 and 58% Ru, which is significantl...
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New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba₀.96Ca0.04Ti0.82Zr0.18O₃ (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Film texture and cryst...
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Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 10...
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ژورنال
عنوان ژورنال: AIP Advances
سال: 2017
ISSN: 2158-3226
DOI: 10.1063/1.4990858